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Vacuum Range:1 x 10^-1 Torr
Max Flow Rate:200 m³/h
Power Consumption:2.5 kW
Operating Temperature:5°C to +50°C
Inlet Pressure:< 1000 Torr
Oil Level Indicator:Yes
Noise Level:75 dB(A)
The Edwards D37232000 is engineered to deliver exceptional vacuum performance, making it an indispensable tool in demanding industrial settings. This high-efficiency vacuum pump is tailored for applications requiring precise control and consistent vacuum levels, ensuring optimal results in semiconductor manufacturing and research laboratories.
Featuring a robust design with enhanced durability and efficiency, the D37232000 boasts a high air throughput, enabling rapid evacuation times and improved productivity. Its compact size and lightweight construction facilitate easy integration into existing systems without compromising on performance.
With a broad vacuum range from 0.1 mbar to 2 mbar, this pump is capable of achieving ultra-high vacuum conditions, essential for processes like thin film deposition and etching in semiconductor fabrication. The advanced vapor diffusion technology ensures minimal contamination and efficient removal of gases, contributing to cleaner and more controlled environments.
Operational flexibility is a key feature of the Edwards D37232000, offering various operational modes to cater to different application requirements. Whether for batch processing or continuous operation, the pump adapts seamlessly to meet the needs of modern industrial workflows.
Safety and maintenance are prioritized with built-in diagnostic tools and user-friendly interface, allowing operators to monitor system performance in real-time and address issues promptly. Regular service intervals and comprehensive maintenance guidelines ensure long-term reliability and cost-effectiveness.
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